proximity lithography

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• ultraviolet proximity lithography — ultravioletinė prošvaisinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая… …   Radioelektronikos terminų žodynas

• Proximity effect — may refer to: *Proximity effect (atomic physics) *Proximity effect (audio) * Proximity Effect (comic) *Proximity effect (electromagnetism) *Proximity effect (electron beam lithography) *Proximity effect (superconductivity) * The Proximity Effect …   Wikipedia

• Proximity effect (electron beam lithography) — The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider than the scanned pattern, due to the interactions of the primary beam electrons with the… …   Wikipedia

• ultraviolet proximity printing — ultravioletinė prošvaisinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая… …   Radioelektronikos terminų žodynas

• Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

• Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …   Wikipedia

• Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

• Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

• Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to …   Wikipedia

• Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …   Wikipedia

• Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia